Abstract
Catalytic chemical vapor deposition is one of the promising methods for thin-film formation on meter-size large-area substrate without plasma excitation at high deposition rates. It is also expected that consumption of energy for film formation is lowered since the efficiency for gas utilization is high. Although Cat-CVD method has been known to present high-quality films at temperatures below about 300C, recently, dense films are obtained at only 100C or at even room temperature. Therefore Cat-CVD method has attracted much attention as coating technique for enhancing the value of plastic films or fiber. Now Cat-CVD method is applied to not only semiconductor or flat-panel display industries but also chemical, ceramics and precise machine industries. In this talk both fundamentals and applications of Cat-CVD technologies are introduced including recent situations of industries.
