Abstract
Hardness of sol-gel derived silica inorganic-organic hybrid films has been evaluated using an indentation test machine. The intrinsic hardness of the hybrid films was obtainable when the thickness of the films was sufficiently larger that of the indentation depth. The hardness of the films increased with increases in heat treatment time and in the amount of inorganic component. The increase in the hardness of the film reflects the development of Si-O-Si network structure.