Abstract
Yttria (Y2O3) films were deposited by laser chemical vapor deposition (LCVD) using Y(dpm)3 (dpm = dipivaloymethanate) precursor. The effect of the total gas pressure (Ptot) on the film morphology was studied. Results showed that the morphology of the yttria film is strongly related to the total gas pressure (Ptot). At lower total gas pressure (Ptot = 0.50 kPa), the deposited films exhibited a columnar microstructure which have a (440) preferred orientation. The surface of the film has a faceted morphology. For higher total gas pressures (Ptot = 1.20 - 2.0 kPa), the deposited films were dense and isotropic with no preferred orientation. The surface morphology showed a cauliflower-like microstructure with grain sizes increased with laser power (PL).
