An Improvement in Deposition Rate of the Nearby Vaporization Chemical Vapor Deposition Method

Abstract

The effects of pretreatment of substrate were studied to improve the deposition rate in the nearby vaporization chemical vapor deposition (NV-CVD). The density of the ZnO particles rose, and that grain diameter became small when it was compared with the case of the untreated and pretreatment on the substrate. When ZnO crystal nucleus were formed by pretreatment, the deposition rate of ZnO improved from 0.58 nm min^-1 in the un-management to 45 nm min^-1.