Abstract
In this study, we investigated the effect of plasma for low-temperature crystallization of Pb(Zr,Ti)O 3 (PZT hereafter) thin films on SrTiO3 seeds by plasma enhanced metalorganic chemical vapor deposition (PECVD). From the previous study, we found that the slow deposition rate of PZT film is critical factor for low-temperature crystallization of PZT films on SrTiO3 seeds. To investigate the mechanism of low-temperature crystallization mechanism, it is necessary to investigate the source decompositions of MO sources for PZT film. The RF plasma is one of useful method for decomposition of MO sources at low-temperature. In-situ and ATR-FT-IR were used for observation of decomposition of MO sources during PZT deposition and final PZT films, respectively. The details of this study is still under investigation.
