Host: The Ceramic Society of Japan
The stability and reactivity of tetrasiloxane [(tBuO)3SiOSi(OH)2]2O (1) in the solid- and liquid-states were studied in detail. FT-IR, solid-state NMR, and TG/DTA-MS analyses confirmed that the crystalline solid of 1 was stable under its melting point but was decomposed via cleavage of Si-O-Si linkages at higher temperature (~150 °C). When 1 was dissolved and stirred in an acidic solution, the partial cleavage of Si-O-Si linkages occurred, while Si-OH groups and Si-OtBu groups remained intact. Furthermore, silylation of 1 with chlorotrimethylsilane was conducted.