Abstract
TiO2 films were prepared by ECR plasma CVD. The effects of plasma on deposition rates, microstructures, crystalline phases and crystal orientations were investigated. TiO2 film prepared at PM=0 kW, Tpre=973 K had a dense isotropic structure with smooth surface, and those prepared at PM=3.0 kW, Tpre=973 K had a columnar cross-sectional structure with complicated faceted surface. The deposition rate increased with increasing PM, and was 60 mm/h at PM=0 kW and 100 mm/h at PM=3.0 kW. ECR plasma accelerated deposition reactions of precursor, resulting in high deposition rate particularly at high precursor rate.
