Host: The Ceramic Society of Japan
TiO2 films were prepared by ECR plasma CVD. The effects of plasma on deposition rates, microstructures, crystalline phases and crystal orientations were investigated. TiO2 film prepared at PM=0 kW, Tpre=973 K had a dense isotropic structure with smooth surface, and those prepared at PM=3.0 kW, Tpre=973 K had a columnar cross-sectional structure with complicated faceted surface. The deposition rate increased with increasing PM, and was 60 mm/h at PM=0 kW and 100 mm/h at PM=3.0 kW. ECR plasma accelerated deposition reactions of precursor, resulting in high deposition rate particularly at high precursor rate.
