Fabrication of Organic-Inorganic Hybrid Pillar Patterns by Photolithography

Abstract

Periodic pillar patterns with submicrometer to micrometer repetitions, which are applicable for various optical devices, were fabricated from organic-inorganic hybrid materials by photolithography. The photosensitive hybrid materials were irradiated periodically by UV light or laser and the unirradiated portions were removed by alcohol. After rinse, the pillar patterns were obtained. The pillar patterns depended on the pillar height, the distance between neighboring pillars and kinds of the rinse liquids. Especially, top-gathering periodic pillar patterns, in which the pillars are gathered at the top, were obtained by self-organization during the evaporation of the remover or the rinse liquids.