Preprints of Annual Meeting of The Ceramic Society of Japan
Preprints of Fall Meeting of The Ceramic Society of Japan
Annual Meeting of The Ceramic Society of Japan, 2008
Session ID : 3C09
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Host: The Ceramic Society of Japan

Preparation of AlN thin films by means of CVD using iodide source under atmospheric pressure
Hiroki Iwane, Naonori Sakamoto, *Naoki Wakiya, Takatou Nakamura, Hisao Suzuki
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Keywords: aluminum nitride, thin film, stress, epitaxial, intermediate layer
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[in Japanese]
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© The Ceramic Society of Japan 2008
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