Abstract
We prepared the alkali titanium oxifluorides and alkali titanium oxides using thermal treatment by the liquid phase deposition. The preparation procedure and characterization of the deposited thin films are discussed. Highly crystallized thin film made of K4Ti4F10O63H2O was deposited on the substrate. After calcination up to 500oC, the potassium titanium oxide formed through a disproportionation reaction of titanium oxyfluoride.