Properties of AlN with oxidized layer having stress relaxation area

Abstract

Regarding the oxidization of AlN, we reported that adhesion strength of the oxidized layer to AlN increased by forming the stress relaxation area. In this study, behavior of the oxidation and the properties of the oxidized AlN were observed. The following results were obtained. 1. Growth of the oxide layer has been accelerated accompanying the progresses of the oxidation reaction. 2. Deterioration in the adhesion strength was not observed till the oxide layer of 50μm. 3. Reflectance increased by increasing the thickness of the oxide layer. The tendency was more remarkable at the short wavelength.