Journal of The Society of Photographic Science and Technology of Japan
Online ISSN : 1884-5932
Print ISSN : 0369-5662
ISSN-L : 0369-5662
Photosensitivities of Water Soluble Photopolymers with Pendant Nitro Substituted Benzalacetophenone Groups
Hidetoshi TAKAOYoichi NAMARIYAMAAkihiro KINOSHITAKenichiro NAKAMURATakateru ASANOSatoshi NISHIBUGentaro NAGAMATSU
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1987 Volume 50 Issue 6 Pages 476-481

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Abstract

Photopolymers containing carboxyl groups as water soluble groups and o, m or p-nitro substituted benzalacetophenone (o-BAp·NO2, m-BAp·NO2, p-BAp·NO2) as sensitive groups are synthesized by condensing 4-(vinylbenzyloxy) acetophenone-co-methacryic acid copolymer with o, m or p-nitro substituted benzaldehyde in alkaline catalyzer.
These condensation polymers were effectively crosslinked by the irradiation of UV light.
Alkaline aqueous developing solution available commercially for negative type presensitized plate can be applied for development of these photopolymers.
Relative sensitivities of the condensation polymers in film state were measured. It is found that order of sensitivity of the synthesized polymers are o-BAp·NO2<m-BAp·NO2<p-BAp·NO2.
The spectral sensitivities of p-BAp·NO2 were observed to be 0.03-0.05 mJ/cm2 at 300-400 nm respectively.

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