Abstract
Experimental Studies have been undertaken on Hg vapour (H°g) removal by pulse-corona-induced plasma chemical process (PPCP) of pulse voltage of a 100 nsrise time. The gases which have H°g initial concentrations of 0.5mg/Nm3 or higher than added to room air or exhaust gas from a municipal refuse incinerator were led todischarge cell. The treated gas was led to gas washing bottle, and there oxidized Hg was removed. Dependence of pulse frequency (f) ranging 50 to 250Hz on H°g removalefficiency (η) has been examined, and measurements concerning Hg removal mechanismhave been made. When waveform of pulse voltage and gas residence time were identical, the relation between η and f was approximately explained byη = 1-exp (-kf). Then, highη was obtained with increasing frequency. The pulse corona power requiredto gain the same η was only 10-30% of direct current one.η little decreased with increasing HLl conc., of even 2mg/Nm3 for exhaust gas.η little increased with increasing HCL conc., decreased with increasing CO conc., and increased markedly with increasing HCl conc. It's considered that O3, O, and active species by HCl dissociation, etc. contributed to H°g oxidation.
