Proceedings of JSPE Semestrial Meeting
2006 JSPE Autumn Meeting
Session ID : G23
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Glass polishing mechanism with CeO2(2)
*Kazuhiro OkudaMakoto Sato
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Abstract
We investigated glass polishing mechanism with ceria slurry by modifying mechanical and chemical conditions, and found chemical conditions were related to polishing performance. In this study we applied this chemical modifying to fixed abrasive polishing, and investigated polishing performance.
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© 2006 The Japan Society for Precision Engineering
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