Precision Nanometrology of Micro–Aspheric Profiles

Abstract

In the 21st century micro aspheric lenses have become more and more important in medical technology and information technology. The necessary accuracy of micro aspheric lenses is higher than 100nm. However, there are no methods to measure the profile of the micro aspheric lenses to assure this accuracy. In this paper a method to measure the profile of the aspheric profile is presented. In this method, error motions of the scanning stage and the profile of the aspheric surface are measured simultaneously, and the method to measure a ring artifact which is used as a reference of the error motion measurement is also presented. Last of all, the measurement result of the artifact is presented.