Proceedings of JSPE Semestrial Meeting
2006 JSPE Spring Meeting
Session ID : H32
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Development Study on New Polishing utilizing Magnetic Responsive Intelligent Fluid
*Kunio ShimadaYoshio MatsuoKeita YamamotoRei HanamuraTeruhisa Nakamura
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CONFERENCE PROCEEDINGS FREE ACCESS

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Abstract
This study is the development of new float polishing technique with large clearance utilizing magnetic compound fluid (MCF) that has been developed as one of magnetic responsive intelligent fluids by one of authors. The possibility and the technique of simultaneous float polishing all surfaces of three–dimensional complex shapes are shown. In this report, the present polishing is clarified to be superior to the cases of utilizing magnetic fluid and MR fluid, and the principle and mechanism of the present polishing is also clarified.
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© 2006 The Japan Society for Precision Engineering
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