Deposition of amorphous carbon thick films by vacuum arc deposition

Abstract

This study focuses on the preparation of thick amorphous carbon (a–C) films by vacuum arc deposition. In order to reduce internal stress that causes to limit thickness of a–C films, a substrate is heated during or after deposition. As a result, 1.5 mm thick a–C films are deposited on heated substrates at 200°C during deposition without delamination. XPS analysis, Raman spectroscopy and TEM observation reveal that the microstructure of the thick a–C film is almost same as that of the films deposited at 25°C.