Development of a novel double-sided polishing machine with high efficiency using a circular movement

Abstract

Authors have been developed a novel double-sided polishing machine with high efficiency for IT. This machine consists of upper, lower platens and a pallet for works. It has a new mechanism for high efficiency by circular moving each other, and production efficiency three times or more than the similar polishing area machine, because our machine has no rotating shaft. Therefore polishing area becomes larger than other type machine. And, the difference of peripheral speed is able to control the low level, since the work pieces do not turn on an axis, and we obtained good roughness and uniform surface was obtained on a sample glass substrate.