Development of Microimprint Technology with Electroformed Nickel Mold (2nd Report)

Proposal of Novel Fabrication Technique of Imprint Mold

Abstract

In order to fabricate polymer-based microstructures such as microchips for Micro Total Analysis System (µTAS) and micro-optical elements with feature sizes on the order of micrometers, we have been developing a microimprint technology with a fine nickel (Ni) mold instead of a conventional photolithography technique. In the present work, an electroplating apparatus with electrolyte injection nozzles has been developed in order to achieve high deposition rate in an electroforming process. Moreover, the applicability of a novel fabrication process of imprint molds was examined. In this technique, a Ni microstructure to be replicated from a structured master is fabricated as an integral part of a stainless-steel support frame structure during electroplating. This offers a relatively rapid technique for fabricating imprint molds.