Proceedings of JSPE Semestrial Meeting
2012 JSPE Autumn Conference
Session ID : E04
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Evaluation of friction-coefficient of silicon carbon nitride films by HWCVD method
*Tomohiro YamadaShingo KawashimaMasatoshi NakagamiYutaka KadotaniAkira Izumi
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Keywords: HWCVD method
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Abstract
We have studied the silicon carbon nitride (SiCN) film by hot-wire CVD (HWCVD) method which is possible to deposit films with low temperature in large area.This report describes the characteristics of SiCN films, such as peel-strength, hardness, and a coefficient of friction, for the purpose of utilizing a SiCN film in the machining field.
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© 2012 The Japan Society for Precision Engineering
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