Study on Interactions between Slurry Dispersibility and Various Pad Surface Statuses and Their Effects on Polishing Rates of Glass Based Materials

Abstract

It has been reported that slurry dispersibility and some roughness parameters of polishing pad surface affect the polishing rates of glass-based materials. On the other hand, generation of polishing pad surface roughnesses is affected by not only the surface processing parameters, but also other factors such as the polishing pads' matrix materials, properties and structures, e.g. pores. Therefore, several kinds of polishing pads have been employed to investigate the effects of polishing slurry dispersibility and the surface roughnesses of various kinds of pads on polishing rates to find out major influential factors.