Proceedings of JSPE Semestrial Meeting
2012 JSPE Autumn Conference
Session ID : N09
Conference information

Host: The Japan Society for Precision Engineering

Standard for CD(Critical Dimension) Measurement (9th Report)
Form Measurement of Resist by Using STEM Images
*Haruki Okito, Satoru Takahashi, Kiyoshi Takamasu
Author information
Keywords: Resist Profile, STEM, Semiconductor, Line Width Measurement
CONFERENCE PROCEEDINGS FREE ACCESS

Details
Download PDF (415K)
Download citation RIS

(compatible with EndNote, Reference Manager, ProCite, RefWorks)

BIB TEX

(compatible with BibDesk, LaTeX)

Text
How to download citation
Contact us
Abstract
[in Japanese]
Content from these authors
© 2012 The Japan Society for Precision Engineering
Previous article Next article
Favorites & Alerts

Recently viewed articles
Share this page
feedback
 Top