2012 JSPE Spring Conference
Session ID : E20
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Host: The Japan Society for Precision Engineering
High-Rate and Low-Temperature Deposition of Si Films Using an Atmospheric-Pressure VHF Plasma
*Teppei Tsushima, Akira Hirano, Takahiro Yamada, Hiromasa Ohmi, Hiroaki Kakiuchi, Kiyoshi Yasutake
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