Abstract
In our previous studies, the possibility of thin ceramic film formation by using a large-area EB irradiation was shown. However, the film formation mechanism has not yet been clarified. In this report, the influences of magnetic and electrical conductivity of a jig supporting an alumina target tube on the film formation were investigated, and the spectrum of plasma generated on the substrate surface during the EB irradiation was measured in order to clarify the mechanism. As a result, it was made clear that the film was formed by sputtering target material with the plasma of workpiece material caused by EB Irradiation.
