Proceedings of JSPE Semestrial Meeting
2016 JSPE Autumn Conference
Session ID : D61
Conference information

Host: The Japan Society for Precision Engineering

Name : 2016 JSPE Autumn Conference

Location : [in Japanese]

Date : September 06, 2016 - September 08, 2016

Improvement of Si-wafer edge flatness, focus on silica particle character included in polishing slurry
*Tomoyuki Toda, Tomoki Yamasaki, Yasunari Miyamoto, Yohei Murakami
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Keywords: silicon, wafer, flatness, slurry, silica, particle
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[in Japanese]
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© 2016 The Japan Society for Precision Engineering
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