Proceedings of JSPE Semestrial Meeting
2020 JSPE Spring Conference
Conference information

Host: The Japan Society for Precision Engineering

Name : 2020 JSPE Spring Conference

Location : [in Japanese]

Date : March 17, 2020 - March 19, 2020

Modelling of CMP process considering surface condition of polishing pad
*Rion Yamaguchi, Wataru Sawada, Norikazu Suzuki, Eiji Syamoto, Yohei Hashimoto, Satoru Yamaki, Hozumi Yasuda, Yoshihiro Mochizuki
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Keywords: chemical mechanical polishing, polishing pad, dress, surface condition
CONFERENCE PROCEEDINGS FREE ACCESS

Pages 646-647

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[in Japanese]
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© 2020 The Japan Society for Precision Engineering
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