Abstract
SnO2 has been promised as a substitutional transparent film for ITO. In order to decrease the resistance of sputtered SnO2 electrode, effect of crystallinity on carrier mobility was investigated for the sputtered SnO2 films. In this research, electronic structure (especially band structure and charge density) of SnO2 with first-principles calculation on quantum theory was clarified. Thereby, the validity of doping and crystallinity in (110) to making low resistance was founded. Besides, application of the seed layer of CVD SnO2 thin film with high crystallinity lowered the resistance of SnO2 of sputtered film.