Journal of The Surface Finishing Society of Japan
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
Research Papers
High Purity Cu Deposition from Cu(I) Ion in CuCl-1-Butylpyridinium Chloride Ambient- Temperature Molten Salts
−Impurity in the Cu Deposit and Purification of the Melts−
Nobuyuki KOURASatoshi SEIKINaotaka TANABETakashi YATSUSHIROKoichi UIShigeru ITO
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2005 Volume 56 Issue 3 Pages 151

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Abstract
High purity Cu electrodeposition from a CuCl-1-Butylpyridinium chloride (BPC) ambient-temperature molten salt electrolyte has been investigated. In this study, silver was examined as an impurity. Ag did not electrodeposit in the Cu deposit and the Cu purity was 99.9999%, if the Ag(I) ion concentration was controlled to be less than 10 ppm in the 66.7mol%CuCl-33.3mol%BPC melt and less than 12ppm in the 44.0mol%CuCl-56.0mol%BPC melt. In addition, a method removal of the Ag(I) ion from the melt was studied. The method of refining by galvanostatic electrolysis at a large current density (25mA·cm−2) was effective, and the Ag(I) ion concentration in the melt decreased to lower than 9ppm. Furthermore, the codeposit of Cu with the N included in the BPC, which was the main content in the bath was also examined. The electrodeposition of N was not recognized.
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© 2005 by The Surface Finishing Society of Japan
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