Abstract
Investigations were made on the morphology and structure of Cr layers electrodeposited on the surface of copper single crystals by means of transmission electron microscopy and electron diffractiometry. The deposition was made in 250g/l solution of chromium trioxide containing 1% of sulfuric acid at 42°C for 1-180sec.
The results obtained were as follows:
1) Cr layers consisted of granular and plate crystals, which developed with the time of electrodeposition.
2) It was considered that granular crystals were usually formed in uneven positions such as pits, and plate crystals were usually formed in smooth parts of the copper substrates.
3) Granular crystals had no coherencies to the substrates; but most of plate crystals had some kinds of coherencies to the substrates.
4) Main coherencies between plate crystals and the substrates were usually as follows:
{111}‹110›Cu||{110}‹100›Cr
{110}‹110›Cu||{111}‹110›Cr
{100}‹110›Cu||{110}‹111›Cr
5) The sharpest diffraction pattern was observed in the deposit formed in 5-30sec. deposition.
6) The {211} twin spots in b. c. c. crystals were often observed when {100} surface of copper was used as substrate.
