Abstract
Titanium compound films (TiC, TiN and TiCxNy) were prepared at about 823K in plasma produced by DC glow discharge, with titanium tetrachloride as the vapor source and hydrogen, nitrogen and, methane as reactant gases. The phase of each compound film was confirmed by X-ray diffraction, and each pattern showed a strongly preferred orientation of (200), the same as that of PVD films. Microhardness was 3000 for TiC, 1800 for TiN and 2000 for TiCxNy. Comparison of the spectral reflectance curves showed that TiN also had almost the same color as PVD film.
