Journal of the Metal Finishing Society of Japan
Online ISSN : 1884-3395
Print ISSN : 0026-0614
ISSN-L : 0026-0614
Pulse Current Plating of Aluminum from a Molten AlCl3-NaCl-KCl Bath and Computer Simulation of the Aluminum Deposition
Nobuyuki KOURAKyoichi MARUOKA
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1987 Volume 38 Issue 10 Pages 471-477

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Abstract
The performance of Al/FeS2 molten salt secondary cells has been studied. When the cell was charging, dendritic deposits were cathodically produced on the Al electrode, and this was found to lower cell performance.
Pulse electrolysis was studied in order to obtain an adherent Al deposit, and computer simulation was carried out to obtain information on the Al deposition.
Both experimental and calculated results showed that the morphology of the Al deposit depends mainly on diffusion layer conditions. The simulated deposition agreed with actual morphology for the dendritic deposit.
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© The Surface Finishing Society of Japan
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