1992 Volume 43 Issue 12 Pages 1178-1183
Amorphous Ni-Ta-Pt alloys were deposited on Fe substrates by ion beam sputtering, and the electrode characteristics of ternary alloy films was investigated by an electrochemical test in 0.5M NaCl solution at 303K. Ion implantation to the substrate and ion irradiation were performed during deposition, and the effect of these processes on electrode characteristics was also investigated. It was found that:
(1) The amorphous Ni-Ta-Pt films produced by ion beam sputtering were spontaneously passive and were immune to pitting corrosion.
(2) When previously immersed in 46wt.% HF for surface activation the films showed very high activity for the production of chlorine by the electrolysis of 0.5M NaCl solution at 303K.
(3) Film quality was improved by irradiation with nitrogen or oxygen ions during deposition.
(4) Ion-implantation of corrosion resistant elements to the substrate had the effect of supperssing substrate corrosion due to NaCl solution that had reached through the pin holes.
