Synthesis of Diamond on Surface Oxidized Chromium Substrates by Microwave Plasma CVD Method

Abstract

The effects of oxide film on diamond deposition on Cr substrates oxidized at high temperature in air or at room temperature in nitric acid were studied using microwave plasma CVD. Diamond is effectively deposited when oxide film forms on the substrate. Deposited diamond density increased markedly, making diamond film when chemically passive film was formed on the substrate using nitric acid. Surface roughening was also effective in depositing diamond film.