Abstract
In this paper, we report the results of the experimental research for the mechanisms of aerosol deposition on semiconductor wafers in clean rooms. By the laser light visualized method, we observed the motion and deposition of particles near and on the wafers. The deposition velocities were measured using the following experimental parameters: voltage of the wafer surface, particle charge quantity, particle size, relative direction of air flow to the wafer surface. It was concluded that among a number of factors, such as inertia, gravitation and diffusion, electrostatic force had the greatest effect on the depositions of submicron or few micron diameter particles.
