Chemical Vapor Deposition of VB₂ Film on Mild Steel Substrates

Abstract

Chemical vapor deposition of VB₂ on mild steel substrate was carried out with the hydrogen reduction of VOCl₃-BCl₃ mixture at the temperature range of 1, 073 to 1, 223K, [VOCl₃/(VOCl₃+BCl₃)] gas molar ratio region of 0.23 to 0.61, and reduction time of 1.8ks.
Thin films of 50μm consisting of pure VB₂ phase have been synthesized on the conditions of substrate temperature 1, 173K, and the gas ratio above 0.40. Smooth surface film of VB₂ having micro-vickers hardness of about Hmv 2, 800 have been prepared at gas ratio above 0.5.