Abstract
Continuous Electrodeionization (CEDI) has been used in the microelectronics industries since the beginning of 1990s. The recent field is becoming to require ultrapure water (UPW) at very low concentration of silica and boron. Whereas, it is difficult to remove such weakly ionized substances up to the required level by conventional CEDI. We have developed a CEDI technology, KCDITM-UP, which makes it possible to be new UPW system. This paper will describe the performance and the system advantage compared to the conventional systems.
