Preparation and Electrochemical Properties of Carbonaceous Thin Films Prepared by C₂H₄/NF₃ Glow Discharge Plasma

Abstract

Carbonaceous thin films were prepared from ethylene, argon and nitrogen trifluoride (NF₃) by plasma assisted chemical vapor deposition (PCVD). The carbon thin films were characterized by scanning electron microscope (SEM), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) and then their electrochemical properties were studied by cyclic voltammetry and charge and discharge.measurements. From SEM image carbon thin films were flat and pin-hole free. XPS spectra indicate that nitrogen and fluorine atoms are not contained in carbon thin films. Crystallinity of the films are affected by the NF₃ flow rate from Raman spectra. The difference of the NF₃ flow rates also affected the results of cyclic voltammetry and charge and discharge measurements. Correlation of the NF3 flow rate and the electrochemical properties of carbon thin films was discussed.