Cation Doped TiO₂ Films by Pulsed Laser Deposition Method and Their Photocatalysis Effects

Abstract

Cation (Nb, Y, Al or Si) doped TiO₂ thin films with anatase phase were fabricated on SiO₂ glass by conventional Pulsed Laser Deposition method. Ionic radius of these cations is larger or smaller than that of Ti. As deposition state, amorphous was formed. Annealing for crystallization was necessary at least 500°C for 10 hours. However, the glass is difficult to be crystallized deposited at 500 °C. Suppress a formation of oxygen deficiency is possible by doping of another cations.