Tetsu-to-Hagane
Online ISSN : 1883-2954
Print ISSN : 0021-1575
ISSN-L : 0021-1575
X-Ray Fluorescence Analysis with Si (Li) Semiconductor Detector
Toshio SHIRAIWANodukatsu FUJINOYasuo ODAKadzuo YAMANAKA
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JOURNAL OPEN ACCESS

1974 Volume 60 Issue 13 Pages 1910-1919

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Abstract
X-ray Fluorescence analysis sytem using Si (Li) non-dispersive detector is developed and it can be applied to steel industrial analysis. The system is especially suitable to the on-line rapid analysis as the Si (Li) detector has very high sensitivity and is not affected by circumstance. The applicatinos of the system are as follows.
(1) On-line X-ray fluorescence analysis of tubings in order to distinguish the type of steel.
(2) X-ray fluorescence analysis of particular shape objects, such as wire cross-section, large forged steel etc.
(3) Thickness measurement of coating on steel sheet zinc coating thickness for galvanized sheet and paint thickness of colored galvanized sheet.
(4) X-ray diffraction
The results are very excellent, resolution power and stability are practically satisfied.
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© The Iron and Steel Institute of Japan

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