Study on the behavior of the Plasma Plume and Film Quality using Pulsed Laser Deposition with Tungsten Target

Abstract

Temporal and spatial behavior of WO3 plasma plume in pulsed laser deposition process have been studied using emission spectroscopic method. Three dimensional study of the plasma plume suggested that the emission plasma plume grew toward substrate direction after the laser irradiation on the target to 2.0 11s, and they disappeared gradually. Emission from the tungsten atoms was dominated in the plasma plume, and there was no emission species such as W ions, O neutrals and molecular species in the plasma plume. W I emission species move with high speed of 5~9 km/s at the delay times (tau d) from 0.5 to 2.0 micro s after the laser irradiation on the tungsten target surface. We also prepared WOx thin films on flexible ITO substrates by PLD method, and it is confirmed that they worked as electrochromic display.