The Effect of Gases on Pyroelectric Properties of PVDF/TiO₂ Treated by Plasma Etcher

Abstract

Composite thin films containing PVDF and TiO₂ have been prepared by using spin coating technique. The highest pyroelectric activity as measured by quasi static method is shown by the composite thin films containing 20 wt% of TiO₂. The doping of TiO₂ in PVDF thin films has reduced the optimum poling electric field needed to be applied in order to observe pyroelectric activity in the composite thin films. Plasma treated composite thin films with Argon (Ar) gas has further increased the pyroelectric coefficient from 33 μCm^-2K^-1 to 83 μCm^-2K^-1. The investigation on the surface morphology and the phases of the composite thin film indicate that the change in the lamella structure and also the existence of the β-phase have contributed to the increase in the pyroelectric activity of the PVDF/TiO₂ composite thin film.