Abstract
In the conventional preparation processes, a heating substrate should be applied to improve their crystallinity and films are easily peeled from substrates. This research was aimed to prepare TiO2 films on slide-glass substrates at room temperature by using magnetron sputtering method. TiO2 powder was used as a target material. Ar gas was used as a sputtering atmosphere. Variations of crystal property and morphology were investigated as a function of substrate temperature. It was found that Anatase-type films could be prepared at room temperature.
