Abstract
Aiming at developing DLC coatings with not only their internal stress relaxed but also their adhesion improved, and their excellent mechanical properties such as high hardness, low friction coefficient, etc preserved at the same time, the deposition of Ti-containing DLC films by magnetron DC sputtering was examined using dual targets of titanium and carbon. The deposition of DLC films or Ti-containing DLC films were respectively carried out in the atmosphere of argon at the pressure of 0.4 Pa by sputtering of only a carbon target or by co-sputtering of both the carbon one and a titanium one. Both the DLC films and the Ti-containing DLC films obtained in this study looked dark brown and appeared to be semitransparent. According to Raman spectroscopy, a typical spectrum for DLC coatings was detected for the Ti-containing DLC films as well as for the DLC films. And it was found that the G band slightly shifted to higher wave numbers and the intensity of the D band was enhanced by co-sputtering, compared to the spectrum for the DLC films. Furthermore, based on both the indentation hardness and the electrical resistivity of the obtained films, it was found that some Ti-containing DLC films could have high hardness such as Si-wafer and could also have 100 times lower electrical resistivity than that of DLC films, at the same time.
