Transactions of the Materials Research Society of Japan
Online ISSN : 2188-1650
Print ISSN : 1382-3469
ISSN-L : 1382-3469
Regular Papers
Nano-micro Processing of Epoxy Resin Systems by Ion Beam Lithography with Multiple Energies and Species
Katsuyoshi TakanoTakahiro SatohYasuyuki IshiiMasashi KokaTomihiro KamiyaTakeru OhkuboMasaki SugimotoHiroyuki NishikawaShu Seki
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2011 Volume 36 Issue 3 Pages 305-308

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Abstract
Techniques of superimposed ion beam writing with different energies and species have been developed at Takasaki Ion Accelerators for Advanced Radiation Application facility, TIARA, of JAEA/Takasaki. A bridge structure was fabricated by the superimposed writing of a girder pattern with 0.5 MeV proton beam adjusting to the bridge pier pattern written with 3 MeV proton beam, using SU-8 photoresist films coated on cured epoxy resin sheets. An upstanding column array by the bridge structure was fabricated by the spot pattern writing of focused 260 MeV Ne7+ beam, aiming to the girder pattern. In the spot pattern writing, the events of single ion hit were detected with 500 hits per spots. This is the first report about the three dimensional micro fabrication using the focused heavy ion beam with several hundred MeV at the countable fluence. The establish of basic techniques for the fabrication of upstanding fine wire array was shown.
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© 2011 The Materials Research Society of Japan
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