Transactions of the Materials Research Society of Japan
Online ISSN : 2188-1650
Print ISSN : 1382-3469
ISSN-L : 1382-3469
Regular Papers
Titanium Dioxide Thin Film Deposition on Ag-Nanoparticles Embedded Silica Glass and Its Photocatalytic Properties
Hiroshi TsujiGo MiyagawaYasuhito Gotoh
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2014 Volume 39 Issue 4 Pages 465-468

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Abstract
Photocatalytic properties of titanium dioxide layer deposited on silica glass (SG) including silver nanoparticles at a shallow depth were studied from an aspect of utilization of surface plasmon resonance (SPR) by nanoparticles. In order to adjust resonant photon energy of surface plasmon to the activation energies of 3.0 and 3.2 eV depending on crystallinity of TiO2, Ag nanoparticles were formed in SG at a shallow depth by silver negative-ion implantation and post annealing. Then, TiO2 layer was formed on it at temperatures of 200 and 500°C by rf magnetron sputter deposition. Ag nanoparticles were confirmed from optical absorption by the SPR at 3.0-3.1 eV. The deposited TiO2 film at substrate temperature of 200°C was found to have anatase-type nano-crystals from results of XRD and optically measured bandgap. Photocatalytic properties of TiO2 layer deposited on Ag-implanted silica glass at 200°C were evaluated by decolorization of methylene blue solution and compared with that of the TiO2 film deposited on unimplanted SG at the same conditions. As a result, the TiO2 layers deposited on Ag-implanted SG after annealing at 700°C were showed an enhancement in photocatalysis of factor 3.26.
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© 2014 The Materials Research Society of Japan
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