Preparation of Sn doped SiO₂ films using SiO₂ and SnO₂ mixture powder target by magnetron sputtering deposition

Abstract

  Sn doped SiO2 thin films, which show strong luminescence by UV excitation, were prepared by a sputtering deposition method using a SnO₂ and SiO₂ powder mixed target. Optical emission spectrum of the plasma using powder target was almost same compared with the conventional sputtering deposition method SiO2 bulk target and Sn atoms were identified in the emission spectrum. XRD and XPS measurements suggest that Sn doped SiO₂ thin films can be prepared using SnO₂ and SiO₂ mixture powder target, and their properties depend on the SiO₂ mixture in the target.