3J-4 Evaluation Method of Fictive Temperature of Synthetic Silica Glasses by the Ultrasonic Microspectroscopy Technology(Measurement Techniques)

Abstract

We developed an evaluation method of T_F for SiO_2 glasses. We clarified that V_1 measurements are extremely useful with a resolution of T_F 0.3-0.4℃, and V_<LSAW> measurements can provide two-dimensional T_F distributions on the specimen surfaces. Glass manufacturers can evaluate T_F of fabricated glass ingots, T_F distributions, and their fabrication processes by this ultrasonic method.