Abstract
A new manufacturing process was employed for the EMI Shielding film applied to plasma display panel which is one of thin type display and the resin to be applied to the process were developed. The metallic foil pattern should be formed on the resin film with high accuracy in this manufacturing process. It is cleared that the developed resin satisfies this function and keeps stable optical properties so that the cloudiness and discoloration do not occurred. This paper is concerned with the basic design technique for the developed resin.
