Chaos

Released on J-STAGE: February 22, 2011 | Volume 11 Issue 2 Pages 157-162

Yoshiro INOUE

Physical Wet Cleaning Technology for Semiconductor Devices

Released on J-STAGE: July 16, 2023 | Volume 37 Issue 2 Pages 189-196

Yoshiyuki SEIKE

Comments on the Terms Used for Gas-Liquid Two-Phae Flow (1)

Released on J-STAGE: February 22, 2011 | Volume 5 Issue 4 Pages 343-347

Tohru FUKANO

Introduction of Residue Fluid Catalytic Cracking Process

Released on J-STAGE: January 28, 2015 | Volume 28 Issue 4 Pages 444-448

Kei SAKAKURA

Introduction of Multiphase Model Capabilities in FLUENT

Released on J-STAGE: May 30, 2003 | Volume 15 Issue 4 Pages 378-381

Shinichi OKA