We have proposed a new technique for recycling silicate glasses, removing metallic elements from them. This technique utilizes a liquid-phase deposition (LPD) method at lower temperatures than 40°C. In this LPD method, cathode ray tube (CRT) glasses are dissolved in hydrofluoric (HF) acid aqueous solution. An LPD-SiOF thin-film with thickness 1 μm was formed on a silicon (Si) substrate. The recycled LPD-SiOF film properties were compared with those for the high quality LPD-SiOF thin-film deposited using semiconductor grade hydrofluorosilicic acid (H
2SiF
6) aqueous solution. In the FTIR analysis, the chemical bonding structure for the recycled LPD-SiOF film is quite similar to high quality LPD-SiOF film. The refractive index at 632.8 nm for the recycled LPD-SiOF film is 1.43 and is the same as that for the high quality LPD-SiOF film. In order to separate metal oxides and metal ions from the H
2SiF
6 aqueous solution, we examined electrochemical analyses. The reactivity of various metal oxides with HF and H
2SiF
6 aqueous solutions was also evaluated. Undissolved metal oxides and precipitated metal fluorides can be separated by filtering. Some residual metal ions, such as Sb
3+ and Fe
3+, can be reduced to metals by electrolysis.
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